Ion Implanter

Organisaatiot: Aalto-yliopiston teknillinen korkeakoulu (TKK) » Elektroniikan, tietoliikenteen ja automaation tiedekunta » TKK Micronova

Eaton Ltd./Axcelis NV-3206 Ion implantation

Victor Ovchinnikov

1987

2001 (old),2003 (new)

High-performance ion implantation system.

Ion implanting

Cassette loadlock

Ion energy                            20 - 200 keV

Beam current                       Up to 500 µA

Ions                                         Ar+, B+, P+ and Si+

Ion dose                                 1x1012 - 1x1017 cm-2

Uniformity                               5%

Implantation time
for dose of 1x1016 cm-2       30 minutes

Wafer size                            4" only

Micronova Nanofabrication Centre - cleanroom section F10. Tietotie 3, 02150 Espoo

Espoo

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