| V-80H chamber - type of molecular sources - 10, 30 and 200cc Knudsen cells - maximum amount of cells - 8 - loaded elements - Ga, Mn, As, Si, Be, Zn, Se
- Maximum substrate size 76 mm dia. - Maximum substrate temperature - 800°C - Base pressure 5x10-11torr - 15kV electron gun and screen for structural monitoring (RHEED) V-80M chamber - type of molecular sources - three 30 cc Knudsen cells, two 8kW E-beam evaporators, RF-plasma cell - loaded materials - Ge, Sb, B2O3 in Knudsen cells, Si, Sn, SnO2, SiO, Mo in E-beam evaporators - available gases for RF plasma cell - O2, H2, N2, Xe - maximum substrate size 76 mm dia. - maximum substrate temperature 900°C. Heater is resistant to oxygen ambient - base pressure 1x10-10torr - 15kV electron gun and screen for structural monitoring (RHEED) |