Electron Beam Microscope/Electron Beam Lithography System

Organisaatiot: Aalto-yliopiston teknillinen korkeakoulu (TKK) » Elektroniikan, tietoliikenteen ja automaation tiedekunta » TKK Micronova

Zeiss Supra 40

Tommy Holmqvist

2005

2005

High resolution electron beam lithography and scanning electron microscope

Imaging and pattering nano structures

Can be converted into electron beam writer

Electron source                        Shottky field emitter

Acceleration voltage                 100V-30kV

Beam current range                 1pA - 10nA

Beam current stability              0.2%/h

Stage span                                 x,y 130mm; z 50mm; R 360°; q -5...+70°

Chamber size                            330x270mm

Specimen size                          up to 4", 6" with limited span

Sensors                                      In-lens secondary electron detector

                                                      Everhart-Thornley secondary electron detector

Resolution:                                 1kV - 2.1nm

                                                      20kV - 1.0nm

                                                      30kV - 0.8nm

Pattern generator                     Raith Quantum (2.5MHz)

Beam blanker                            Electrostatic (100kHz)


 

Micronova Nanofabrication Centre - analysis lab R13. Tietotie 3, 02150 Espoo

Espoo

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