Ellipsometer

Organisaatiot: Aalto-yliopiston teknillinen korkeakoulu (TKK) » Elektroniikan, tietoliikenteen ja automaation tiedekunta » TKK Micronova

Plasmos SD 2300

Heli Talvitie

2006

Works using rotating analyzer method

Measurement of film thickness and refractive index of optically transparent and absorbing layers

Light source                                            He-Ne laser, wavelength 632.8 nm

Time of measurement                           under 1 s/point

Wafer size                                                 up to 145 mm

Incidence angle range                            35 - 73 °

Analyzed layer number                            up to 5

Thickness error for SiO2 film

(fixed refractive index)                            < 0.6 nm

Micronova Nanofabrication Centre - cleanroom section F7. Tietotie 3, 02150 Espoo

Espoo

Powered by Evianet Solutions Oy