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» Capability Classification
Photolithography
1. Nanofabrication
1.1. Nanolithography and Direct Patterning
1.1.1. Photolithography
Instruments
Manual High Precision Mask Aligner - University of Oulu
Mask aligner - Tampere University of Technology
Photolithography mask patterning device - University of Oulu
Spin coater - Savonia University of Applied Sciences
Spin Coater - University of Oulu
Spin Coater - University of Oulu
UV exposure system + Mask aligner - Savonia University of Applied Sciences
UV Mask Aligner - University of Jyväskylä
UV-Mask aligner with NIL support - Tampere University of Technology
Wet Bench - University of Oulu
Expertise
Nanoprecision positioning systems with laser interferometric feedback - ACWACO Ltd.
1.1.2. Electron Beam Lithography (EBL)
1.1.3. Nanoimprint Lithography (NIL)
1.1.4. Laser Interference Lithography (LIL)
1.1.5. Near Field Holography (NFH)
1.1.6. Micro Contact Printing
1.1.7. Focused Ion Beam Milling
1.1.8. Ion/Electron Beam Assisted Vapor Deposition
1.1.9. Dip Pen Nanolithography
1.1.10. Other Nanolithography and Direct Patterning
2. Characterization
3. Computation, Modeling and Simulation
4. Other
MIKTECH OY - Graanintie 5, 50190 Mikkeli FINLAND
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