Name and Model: Karl Suss MA45
Contact Person: Antti Nuottajärvi nuanka@jyu.fi
Year of Manufacture:
Year of Installation:
General Technical Information: Mask aligner for photolithography
Desrcription of Use: Photolithography exposures
Key Features and Accessories:
UV400 Hg lamp 350W
130x130 mm exposure area
Able to take 1" - 4" wafers of single chips
Mask holder for 4 pcs of 22x26 mm glass masks
Splitfield microscope with x100 magnification
Micrometer manipulators in table X, Y and Rot
Key Specifications:
Photograph:
Location: University of Jyväskylä, Nanoscience Center, Cleanroom Survontie 9, 40500 Jyväskylä
City: Jyväskylä
Additional information:
Booking:
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