Chemical Vapor Deposition (CVD)

Name and Model: Oxford Plasmalab80Plus (+RIE)

Contact Person: Antti Nuottajärvi
nuanka@jyu.fi +358503956002

Year of Manufacture: 2004

Year of Installation: 2004

General Technical Information: PECVD configured in Plasmalab80+ system with RIE console.

Desrcription of Use: SiO, SiN, SiC,.. thin film deposition.

Key Features and Accessories: RF powered electrode with auto-matching tuner unit. Substrate table can be heated.

Key Specifications:

13.56 MHz RF generator

Table heating up to 400°C

Gases in use: SiH₄(5%)/Ar, CF₄/O₂(20%), CH₄, NH₃, N₂O, N₂

RF power: 10-300 W

Software: PC2000

Photograph:

Location: University of Jyväskylä, Nanoscience Center, Cleanroom
Survontie 9, 40500 Jyväskylä

City: Jyväskylä