E-beam Lithography Tool / SEM

Name and Model: LEO 1430

Contact Person: Antti Nuottajärvi
nuanka@jyu.fi +358503956002

Year of Manufacture: 2000

Year of Installation: 2000

General Technical Information: High resolution electron beam workstation.

Desrcription of Use: Nanostructures patterning on e-beam resists. Imaging.

Key Features and Accessories:

Key Specifications:

Electron gun                                               LaB6

Maximum acceleration voltage               30kV

Probe current                                              10-12 – 10-7 A

Pumping                                                      Turbo / Ion pump

Detector                                                        SE

Maximum resolution                                  3.5 nm

Beam blanker                                             Electrostatic

Pattern generator                                       Elphy Quantum

Stage max. movements X,Y,Z and R,T  100, 125, 35 and 360, 90

Photograph:

Location: University of Jyväskylä, Nanoscience Center, Cleanroom Lithography section YN010.6.
Survontie 9, 40500 Jyväskylä

City: Jyväskylä