Name and Model: Karl Suss MJB 3
Contact Person: Tomi Ryynänen
Year of Manufacture: ???
Year of Installation: 2005
General Technical Information: Manual mask aligner
Desrcription of Use: Mask alignment and contact exposure in photolithography process.
Key Features and Accessories: Alignment to x, y and θ directions, microscope for accurate alignment, backside alignment option (never used).
Key Specifications: Optics: UV300 280 – 350 nm Light source: 350W mercury lampWafer size: up to 3” Ø Substrate size: up to 3” x 3”Wafer / substrate thickness: 0 – 4.5 mm Mask size: up to 4” x 4”Resolution: ~1 µmAvailable photoresists: ma-P 1200, SU-8
Photograph:
Location: Tampere University of Technology, Sähkötalo building, ASE cleanroom, Se209a.
City: Tampere
Additional information:
Booking: Via contact person
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