Name and Model: Suss MicroTec RC8
Contact Person: Hannu Moilanen
Year of Manufacture: 2001
Year of Installation: 2006
General Technical Information: Semi-automatic spin coater with hot plate
Desrcription of Use: Device is used for photoresist spin-coating
Key Features and Accessories:
Spinner: Uses the GYRSET closed cover spin coating system that offers uniform coatings with reduced consumption and less edge buildup. Handles up to 8 inch round or 6 inch square substrates. Multi-size configuration with automatic GYRSET cover size detection and automatic maximum spin speed limitation set up. Stainless steel cabinet. Pneumatic Dispenser Arm. Edge bead remover. Nitrogen blow. Adapter for small substrates. Hot plate: Motorized pin lift with programmable speed and extension. Pin lock for height control. Programmable time range. Dual display for set and actual temperatures.
Key Specifications:
SPINNERMaximum substrate size:up to 8” wafer or 6”x6” substrateMaximum speed:RC8 GYRSET 8 3000 rpm, RC8 standard plate 7000 rpmMaximum acceleration: 5 000 rpm/sTime range:0 - 999 sSpeed regulation:TachometricSpeed control:GalvanometricHOT PLATESubstrate size:up to 8” wafer or 6”x6” substrate with pin lift from 4” waferTemperature range: from room temperature to 400°CResolution: ± 1°CUniformity: ± 1°C
Photograph:
Location: University of Oulu, Center of Microscopy and Nanotechnology, Cleanroom
City: Oulu
Additional information: Call the contact person for more information
Booking: Call the contact person for more information
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