Name and Model:
Contact Person: Seppo Lindroos
Year of Manufacture:
Year of Installation:
General Technical Information: Dip-type SILAR reactor (based on a Gilson xyz-laboratory robot).
Desrcription of Use: Ionic layer deposition of uniform, conformal thin films for various applications with atomic layer accuracy from solution phase at room temperature and normal pressure.
Key Features and Accessories: Various insulating, semiconducting and conducting materials, including several types of oxides, chalcogenides, metals, can be deposited. Liquid precursors can be used
Key Specifications: Deposition at room temperature and normal pressure.
Photograph:
Location: University of Helsinki, Department of Chemistry, Laboratory of Inorganic Chemistry, A.I.Virtasen aukio 1, 00560 Helsinki.
City: Helsinki
Additional information: Contact the contact person for details.
Booking: Contact the contact person for details.
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