Name and Model: Picosun SUNALE
Contact Person: Mikko Ritala
Year of Manufacture: 2005
Year of Installation: 2006
General Technical Information: Flow-type atomic layer deposition reactor.
Desrcription of Use: Atomic layer deposition of uniform, conformal thin films for various applications with atomic layer accuracy. Template-directed preparation of micro and nanostructures, for example nanotubes.
Key Features and Accessories: Various oxides and noble metals can be deposited. Liquid, solid and gaseous precursors can be used. Large reaction chamber suitable for irregularly shaped substrates. A flow-through sample holder for rapid coating of macroscopic through-porous substrates.
Key Specifications: Maximum deposition temperature: 400°C
Photograph:
Location: University of Helsinki, Department of Chemistry, Laboratory of Inorganic Chemistry, A.I.Virtasen aukio 1, 00560 Helsinki.
City: Helsinki
Additional information: Contact the contact person for details.
Booking: Contact the contact person for details.
Are you sure you want to delete this instrument?
