Name and Model: Eaton Ltd./Axcelis NV-3206 Ion implantation
Contact Person: Victor Ovchinnikov
Year of Manufacture: 1987
Year of Installation: 2001 (old),2003 (new)
General Technical Information:
Desrcription of Use:
Key Features and Accessories:
Key Specifications:
Ion energy 20 - 200 keV
Beam current Up to 500 µA
Ions Ar+, B+, P+ and Si+
Ion dose 1x1012 - 1x1017 cm-2
Uniformity 5%
Implantation time for dose of 1x1016 cm-2 30 minutes
Photograph:
Location: Micronova Nanofabrication Centre - cleanroom section F10. Tietotie 3, 02150 Espoo
City: Espoo
Additional information:
Booking: http://www.micronova.fi/booking
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