Name and Model: Zeiss Supra 40
Contact Person: Tommy Holmqvist
Year of Manufacture: 2005
Year of Installation: 2005
General Technical Information: High resolution electron beam lithography and scanning electron microscope
Desrcription of Use: Imaging and pattering nano structures
Key Features and Accessories: Can be converted into electron beam writer
Key Specifications:
Electron source Shottky field emitter
Acceleration voltage 100V-30kV
Beam current range 1pA - 10nA
Beam current stability 0.2%/h
Stage span x,y 130mm; z 50mm; R 360°; q -5...+70°
Chamber size 330x270mm
Specimen size up to 4", 6" with limited span
Sensors In-lens secondary electron detector
Everhart-Thornley secondary electron detector
Resolution: 1kV - 2.1nm
20kV - 1.0nm
30kV - 0.8nm
Pattern generator Raith Quantum (2.5MHz)
Beam blanker Electrostatic (100kHz)
Photograph:
Location: Micronova Nanofabrication Centre - analysis lab R13. Tietotie 3, 02150 Espoo
City: Espoo
Additional information: Veli-Matti Airaksinen, TKK Micronova
Booking:
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