Name and Model: Plasmos SD 2300
Contact Person: Heli Talvitie
Year of Manufacture:
Year of Installation: 2006
General Technical Information: Works using rotating analyzer method
Desrcription of Use: Measurement of film thickness and refractive index of optically transparent and absorbing layers
Key Features and Accessories:
Key Specifications:
Light source He-Ne laser, wavelength 632.8 nm
Time of measurement under 1 s/point
Wafer size up to 145 mm
Incidence angle range 35 - 73 °
Analyzed layer number up to 5
Thickness error for SiO2 film
Photograph:
Location: Micronova Nanofabrication Centre - cleanroom section F7. Tietotie 3, 02150 Espoo
City: Espoo
Additional information: Paula Heikkilä, TKK Micronova
Booking: Via Heli Talvitie, Paula Heikkilä or Veli-Matti Airaksinen
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