Electron Beam Coater

Organization: Aalto University School of Science and Technology (TKK) » Faculty of Electronics, Communications and Automation » TKK Micronova

Instrumentti Mattila IM9912

Matthias Meschke

2007

2007

A versatile system for thin film deposition

Thin film deposition

10 kV electron gun, load lock, oxygen inlet for tunnel junction fabrication, system is cryopumped, six targets on a revolver typed platform

Additional features:

  • Two angle sample tilting
  • automatic sample rotation
  • substrate heating with quartz lamp and temperature measurement by pyrometer
  • substrate cleaning with argon plasma gun 

Evaporated materials                 Al, Ti, Au, Pd

Wafer size                                     max 4 inch, clamps for small pieces

Typical deposition range           10 nm/min

Working pressure range           10-6 to 10-8 mbar

Substrate temperature               20°C to 250°C

Loading time                               10 min 

Micronova Nanofabrication Centre - maintenance area of the cleanroom, between F9 and F10. Tietotie 3, 02150 Espoo

Espoo

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