Name and Model: Jeol JSM-840 SEM + Raith Elphy Plus 3.0
Contact Person: Ari Halvari ari.halvari@savonia.fi+358 44 785 5579
Year of Manufacture: 2003 (software), 1997 (ebeam hardware), 1984 (SEM)
Year of Installation: 2007
General Technical Information: Scanning electron microscope with an integrated electron beam lithography system
Desrcription of Use: Nanostructures patterning on e-beam resists. Imaging.
Key Features and Accessories:
Motorized XY-stage. Beam blanking. Load lock for quick access. SemAfore 5.0 digitizer.
Key Specifications:
Filament: Tungsten
Voltage: 0.5 – 40 kV
Maximum resolution / magnification : 4 nm / 10 – 300.000x
Minimum line width: < 100 nm
Maximum writefield: about 4 mm
Photograph:
Location: Savonia University of Applied Sciences, School of Engineering and Technology, Microkatu 1C, FI-70201 Kuopio, Finland
City: Kuopio
Additional information: Available only as a service for short term use. With long term needs call the contact person for more information.
Booking: In case of "as a service", please, call contact person.
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