Name and Model: Oxford Instruments Plasmalab System 100
Contact Person: Pertti Pääkkönen
Year of Manufacture: 1999
Year of Installation: 2004
General Technical Information: Reactive Ion Etching tool with Inductive Coupled Plasma (ICP) Source.
Desrcription of Use: Etching of micro and nanostructures on quartz and metals.
Key Features and Accessories: Reactive Ion Etching tool with Inductive Coupled Plasma source, helium backside cooling.
Key Specifications:
Photograph:
Location:
City: Joensu
Additional information: Long term usage without an operator is possible within co-operative projects.
Booking: Call contact person for service.
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