Reactive Ion Etching

Organization: University of Eastern Finland » Department of Physics and Mathematics (Joensuu)

Oxford Instruments Plasmalab 80plus

Pertti Pääkkönen

2005

2005

Reactive Ion Etching tool.

Etching of micro and nanostructures on quartz.

Reactive Ion Etching tool with helium backside cooling.

Electrode diameter 240 mm
Plasma generation
13,56 MHz, 300 W
Process gases O2, Ar, CHF3, SF4, CF6, He
  

Joensuu

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