Nanoimprinter

Organization: University of Eastern Finland » Department of Physics and Mathematics (Joensuu)

Obducat Eitre3

Pertti Pääkkönen

1998

1998

Nanoimprint lithography tool with UV module.

Hot embossing, UV curing.

Thermal and UV curing at maximum of 3” samples, computer controlled interface.

Substrate size 76 mm
Imprint pressure range
0 - 70 bar
Temperature range
20 - 250 °C
UV radiation 40 - 100 mW/cm2
UV wavelength 250 - 400 nm
  

Joensuu

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