Electron Beam Lithography

Organization: University of Eastern Finland » Department of Physics and Mathematics (Joensuu)

Name and Model: Vistec EBPG5000+ES HR

Year of Manufacture: 2006

Year of Installation: 2006

General Technical Information: Modern Gaussian shaped electron beam patterning tool with nanometer scale patterning accuracy.

Desrcription of Use: Nanostructure patterning on e-beam resist.

Key Features and Accessories: Electron beam pattern generator with 50 kV or 100 kV energy, 5 nm spot size and 6” x 6” laser interferometric controlled XY stage. Alignment microscope for precise alignment of samples.

Key Specifications:

Filament	Thermal Field Emission Gun
Beam energy	50 kV or 100 kV
Beam current	100 pA - 100 nA
Beam size	6 nm @ 50 kV
	5 nm @ 100 kV
Resolution	10 nm linewidth
Patterning area	155 mm x 155 mm
Stage interferometric resolution	0,618
Scan field distortion	<16 nm over 800 µm @ 50 kV
	<11 nm over 500 µm @ 100 kV
Stitching accuracy	<60 nm over 800 µm @ 50 kV
	<29 nm over 500 µm @ 100 kV
Overlay accuracy	<31 nm over 800 µm @ 50 kV
	<53 nm over 500 µm @ 100 kV
Orthogonality	0,8 µrad

Photograph:

Location:

City: Joensuu

Electron Beam Lithography

Organization: University of Eastern Finland » Department of Physics and Mathematics (Joensuu)

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