Name and Model: Micronic LRS-55
Contact Person: Hannu Moilanen
Year of Manufacture:
Year of Installation:
General Technical Information:
Desrcription of Use:
The Micronic LR-55 is a device used in fabrication of photolithography masks. It can be used in manufacturing of large masks till the size of 20” (50 cm). Masks can be prepared on quartz or soda lime substrates and the smallest repeatable features are 3 µm.
Key Features and Accessories:
Key Specifications: He-Cd laser (442 nm)Smallest feature size: 3 µmSize of the mask: 4”x4”-20”x20” (10x10 cm-50x50 cm)Quartz and soda lime substratesMask metal: chromeCAD file formats: .dxf and .gds
Photograph:
Location: University of Oulu, Center of Microscopy and Nanotechnology, Cleanroom
City: Oulu
Additional information:
Booking:
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