Wet Bench

Name and Model: Modutek

Contact Person: Hannu Moilanen

Year of Manufacture:

Year of Installation: 2006

General Technical Information: Wet bench can be used in wet etching of materials and fabrication of microstructures. Etching solutions are selected depending on material under processing

Desrcription of Use:

Key Features and Accessories: Basins have wafer holders which enable of processing up to 25 4” size silicon wafers at the time.

Key Specifications:

3 etching basins

One rinse basin

Heating system for the basins

Photograph:

Location: University of Oulu, Center of Microscopy and Nanotechnology, Cleanroom

City: Oulu