RTA Furnace

Organization: University of Oulu » Center of Microscopy and Nanotechnology

AG Associates Heatpulse 610

Hannu Moilanen

RTA (Rapid Thermal Annealing) furnace is used for rapid heat treatment of materials

The furnace can heat the samples at the temperature of hundreds of degrees within a few seconds. It can be used for example post-annealing of thin films.

Maximum temperature: 800 °C
Maximum rate of temperature increase: 20 °C/s
Atmospheres: air, N2, H2
Maximum sample size: 6”

University of Oulu, Center of Microscopy and Nanotechnology, Cleanroom

Oulu

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