NT-MDT NTegra
Antti Säynätjoki
antti.saynatjoki(at)tkk.fi
2005
2005
Substrate size:
Sample size ca. 10 mm x 20 mm (max. smaller dimension ~12 mm)
Scanning head configuration for AFM, LFM, FMM and MFM: Maximum wafer size 100mm (only center of the max-size wafer can be measured). Vertical resolution for scanning head configuration 1 nm.
Allowed materials:
Hard, non-sticky materials.
Forbidden Materials:Sticky materials.
Scanning probe microscope for measuring the nanoscale morphology of surfaces.
Operating modes: Atomic force microscopy (AFM), scanning tunneling microscopy (STM), lateral force microscopy (LFM), force modulation microscopy (FMM), electrical SPM imaging (SKM, SRI, SCM, EFM), magnefic force microscopy (MFM) and oxidation & force lithography.
• Maximum scanning area 14 µm
• Vertical resolution 3 Å
• Diameter of probe tip 10-100 nm