Name and Model:
Contact Person: Vesa-Pekka Lehto
Year of Manufacture: 2008
Year of Installation: 2009
General Technical Information: Electrochemical etching system for 10 cm silicon wafers
Desrcription of Use: Production of porous silicon
Key Features and Accessories:
Key Specifications: Maximum current 19 ASilicon wafer size 10 cm
Photograph:
Location: University of Eastern Finland, Department of Physics and Mathematics, Yliopistonranta 1 F (Melania), 70211 Kuopio
City: Kuopio
Additional information:
Booking: Please contact the contact person.
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