Spin coater

Name and Model: ATMsse OPTIspin ST20

Contact Person: Pertti Pääkkönen

Year of Manufacture: 2009

Year of Installation: 2009

General Technical Information: Spin coater with hot plate

Desrcription of Use:

• Fabrication of electron beam resist and photoresist samples

Key Features and Accessories:

• Spin coater with covered chuck
• Hotplate
• Programmable recipes
• Compatible substrates: 6"x6", 5"x5", 2.5"x2.5", 150 mm wafer, 100 mm wafer, 2" wafer, 1" piece parts.

Key Specifications:

• Rotaton speed: 1 - 10.000 RPM
• Acceleraton: 1 - 50.000 RPM/sec
• Max substrate size: diameter 8" or square 6"x6"
• HP temperature range: up tp 300 °C 0.1 °C

Photograph:

Location: University of Joensuu, Department of åhysics and Mathematics

City: Joensuu