Custom
David Cameron
david.cameron@lut.fi Phone 0408352649
2005
2005
Load-locked in-line sputtering system with cryopump. Two targets .
Deposition of metals, compounds, multilayers. Study of the deposition process.
System has an optical feedback stoichiometry control system for reactive sputtering.
It is equipped with a Hiden EQP mass-energy analyser for measuring the depositing particles.
Pulsed DC magnetron and substrate bias power supplies.
Unheated substrate scanning system or fixed position high temperature heated substrate.